Total ionizing dose radiation effects of RF PDSOI LDMOS transistors

被引:0
|
作者
Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China [1 ]
机构
来源
Pan Tao Ti Hsueh Pao | 2008年 / 11卷 / 2158-2163期
关键词
Electric impedance measurement - MOS devices - Transistors - Silicon on insulator technology - Threshold voltage - Ionizing radiation - Radiation effects;
D O I
暂无
中图分类号
学科分类号
摘要
The effects of total ionizing dose radiation on direct current (DC) and small-signal radio frequency (RF) performance of multi-finger RF partial deplete silicon-on-insulator lateral double diffused MOS (PDSOI LDMOS) transistors are investigated. The radiation response of the LDMOS transistors with different device structures is characterized for an equivalent gamma dose up to lMrad(Si) at room temperature. The front and back gate threshold voltages, off-state leakage, transconductance, and output characteristics are measured before and after radiation, and the results show a significant degradation of DC performance. Moreover, high frequency measurements for the irradiated transistors indicate remarkable declines of 5-parameters, cutoff frequency, and maximum oscillation frequency to lMrad(Si) exposure levels. Compared to the transistors with the BTS contact structure, the transistors with the LBBC contact do not show its excellent DC radiation hardness when the transistors operate at alternating current (AC) mode. ©2008 Chinese Institute of Electronics.
引用
收藏
相关论文
共 50 条
  • [21] Total ionizing dose effects on nanosheet and nanowire field effect transistors
    Han, Jin-Woo
    Kim, Jungsik
    Meyyappan, M.
    MICROELECTRONICS RELIABILITY, 2021, 121
  • [22] Influence of characteristics' measurement sequence on total ionizing dose effect in PDSOI nMOSFET
    解鑫
    毕大伟
    胡志远
    朱慧龙
    张梦映
    张正选
    邹世昌
    Chinese Physics B, 2018, 27 (12) : 555 - 562
  • [23] A total dose radiation model for deep submicron PDSOI NMOS
    Bu Jianhui
    Bi Jinshun
    Liu Mengxin
    Han Zhengsheng
    JOURNAL OF SEMICONDUCTORS, 2011, 32 (01)
  • [24] Comprehensive study of the radiation effects on the LDMOS transistors
    Lei Z.
    Zhang C.
    Wu M.
    Zou X.
    Yan J.
    Chen Z.
    Microelectronics Reliability, 2022, 139
  • [25] A total dose radiation model for deep submicron PDSOI NMOS
    卜建辉
    毕津顺
    刘梦新
    韩郑生
    半导体学报, 2011, 32 (01) : 33 - 35
  • [26] Research on Negative Bias Temperature Instability Effects Under the Coupling of Total Ionizing Dose Irradiation for PDSOI MOSFETs
    Peng, Chao
    Gao, Rui
    Lei, Zhifeng
    Zhang, Zhangang
    Chen, Yiqiang
    En, Yun-Fei
    Huang, Yun
    IEEE ACCESS, 2021, 9 : 22587 - 22594
  • [27] Total ionizing dose effect in 0.2 μm PDSOI NMOSFETs with shallow trench isolation
    Peng, Chao
    Hu, Zhiyuan
    Zhang, Zhengxuan
    Huang, Huixiang
    Ning, Bingxu
    Bi, Dawei
    MICROELECTRONICS RELIABILITY, 2014, 54 (04) : 730 - 737
  • [28] Punch-through effects in RF bulk LDMOS transistors
    Cortes, I.
    Fernandez-Martinez, P.
    Flores, D.
    Hidalgo, S.
    Rebollo, J.
    2007 SPANISH CONFERENCE ON ELECTRON DEVICES, PROCEEDINGS, 2007, : 344 - +
  • [29] Electrical Stress and Total Ionizing Dose Effects on MoS2 Transistors
    Zhang, Cher Xuan
    Newaz, A. K. M.
    Wang, Bin
    Zhang, En Xia
    Duan, Guo Xing
    Fleetwood, Daniel M.
    Alles, Michael L.
    Schrimpf, Ronald D.
    Bolotin, Kirill I.
    Pantelides, Sokrates T.
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2014, 61 (06) : 2862 - 2867
  • [30] Total-Ionizing-Dose Effects in IGZO Thin-Film Transistors
    Guo, Zixiang
    Li, Kan
    Li, Xun
    Luo, Xuyi
    Zhang, En Xia
    Reed, Robert A.
    Schrimpf, Ronald D.
    Fleetwood, Daniel M.
    Chasin, A.
    Mitard, J.
    Linten, D.
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2023, 70 (08) : 2002 - 2007