Preparation of High-Performance Transparent Al2O3 Dielectric Films via Self-Exothermic Reaction Based on Solution Method and Applications

被引:0
|
作者
Fang, Xuecong [1 ]
Ning, Honglong [1 ]
Zhang, Zihan [1 ]
Yao, Rihui [1 ]
Huang, Yucheng [1 ]
Yang, Yonglin [1 ]
Cheng, Weixin [1 ]
Jin, Shaojie [1 ]
Luo, Dongxiang [2 ,3 ,4 ]
Peng, Junbiao [1 ]
机构
[1] South China Univ Technol, Guangdong Basic Res Ctr Excellence Energy & Inform, Sch Mat Sci & Engn, State Key Lab Luminescent Mat & Devices, Guangzhou 510640, Peoples R China
[2] Guangzhou Univ, Huangpu Hydrogen Innovat Ctr, Sch Chem & Chem Engn, Guangzhou Key Lab Clean Energy & Mat, Guangzhou 510006, Peoples R China
[3] South China Normal Univ, South China Acad Adv Optoelect, Guangdong Prov Key Lab Opt Informat Mat & Technol, Guangzhou 510006, Peoples R China
[4] Shenzhen Univ, Coll Phys & Optoelect Engn, Key Lab Optoelect Devices & Syst, Minist Educ & Guangdong Prov, Shenzhen 518060, Peoples R China
基金
国家重点研发计划; 中国国家自然科学基金;
关键词
low temperature; self-exothermic reaction; MIM device; transparent; low leakage current; high dielectric constant; ATOMIC LAYER DEPOSITION; LOW-TEMPERATURE; THERMAL-DECOMPOSITION; GATE INSULATOR; TRANSISTORS; MECHANISM;
D O I
10.3390/mi15091140
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
As the competition intensifies in enhancing the integration and performance of integrated circuits, in accordance with the famous Moore's Law, higher performance and smaller size requirements are imposed on the dielectric layers in electronic devices. Compared to vacuum methods, the production cost of preparing dielectric layers via solution methods is lower, and the preparation cycle is shorter. This paper utilizes a low-temperature self-exothermic reaction based on the solution method to prepare high-performance Al2O3 dielectric thin films that are compatible with flexible substrates. In this paper, we first established two non-self-exothermic systems: one with pure aluminum nitrate and one with pure aluminum acetylacetonate. Additionally, we set up one self-exothermic system where aluminum nitrate and aluminum acetylacetonate were mixed in a 1:1 ratio. Tests revealed that the leakage current density and dielectric constant of the self-exothermic system devices were significantly optimized compared to the two non-self-exothermic system devices, indicating that the self-exothermic reaction can effectively improve the quality of the dielectric film. This paper further established two self-exothermic systems with aluminum nitrate and aluminum acetylacetonate mixed in 2:1 and 1:2 ratios, respectively, for comparison. The results indicate that as the proportion of aluminum nitrate increases, the overall dielectric performance of the devices improves. The best overall performance occurs when aluminum nitrate and aluminum acetylacetonate are mixed in a ratio of 2:1: The film surface is smooth without cracks; the surface roughness is 0.747 +/- 0.045 nm; the visible light transmittance reaches up to 98%; on the basis of this film, MIM devices were fabricated, with tested leakage current density as low as 1.08 x 10(-8) A/cm(2) @1 MV and a relative dielectric constant as high as 8.61 +/- 0.06, demonstrating excellent electrical performance.
引用
收藏
页数:13
相关论文
共 50 条
  • [1] A reaction study for Al-Ni2O3 nano self-exothermic materials
    Yu, Wenzhen
    Gao, Yimin
    Wang, Yiran
    CERAMICS INTERNATIONAL, 2024, 50 (04) : 6909 - 6920
  • [2] Mechanically robust Al2O3 f/LaPO4/Al2O3 composite for high-performance microwave transparent
    Jing, Linhan
    Luo, Fa
    Xu, Hailong
    Wang, Chunhai
    Pan, Haijun
    JOURNAL OF ALLOYS AND COMPOUNDS, 2025, 1010
  • [3] High-performance dielectric film capacitors based on cellulose/Al2O3 nanosheets/PVDF composites
    Zheng, Xin
    Yin, Yanan
    Wang, Peng
    Sun, Chenyu
    Yang, Quanling
    Shi, Zhuqun
    Xiong, Chuanxi
    INTERNATIONAL JOURNAL OF BIOLOGICAL MACROMOLECULES, 2023, 243
  • [4] Transparent ZnO:Al2O3 films with high breakdown voltage and resistivity
    Liu, Shiying
    Liu, Shan
    Zhou, Yaoyao
    Piao, Yongjun
    Li, Guojian
    Wang, Qiang
    APPLIED PHYSICS LETTERS, 2018, 113 (03)
  • [5] Preparation and Properties of TiO2/Al2O3 Stacked High k Gate Dielectric Films
    Ling Huiqin
    Ding Dongyan
    Zhou Xiaoqiang
    Li Ming
    Mao Dali
    RARE METAL MATERIALS AND ENGINEERING, 2008, 37 : 326 - 329
  • [6] Ni/Al2O3/epoxy high-k composites with ultralow nickel content towards high-performance dielectric applications
    Wang, Jing
    Shi, Zhicheng
    Mao, Fan
    Wang, Xin
    Zhang, Kun
    Shi, Jing
    RSC ADVANCES, 2016, 6 (49): : 43429 - 43435
  • [7] High-Performance GaN MOSHEMTs Fabricated With ALD Al2O3 Dielectric and NBE Gate Recess Technology for High Frequency Power Applications
    Lin, Yen-Ku
    Noda, Shuichi
    Huang, Chia-Ching
    Lo, Hsiao-Chieh
    Wu, Chia-Hsun
    Quang Ho Luc
    Chang, Po-Chun
    Hsu, Heng-Tung
    Samukawa, Seiji
    Chang, Edward Yi
    IEEE ELECTRON DEVICE LETTERS, 2017, 38 (06) : 771 - 774
  • [8] High-Performance TiN/Al2O3/ZnO/Al2O3/TiN Flexible RRAM Device With High Bending Condition
    Kumar, Dayanand
    Chand, Umesh
    Siang, Lew Wen
    Tseng, Tseung-Yuen
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2020, 67 (02) : 493 - 498
  • [9] Effect of Content on Microstructure and Dielectric Performance of PI/Al2O3 Hybrid Films
    Liu, Xiaoxu
    Yin, Jinghua
    Chen, Minghua
    Bu, Wenbin
    Cheng, Weidong
    Wu, Zhonghua
    NANOSCIENCE AND NANOTECHNOLOGY LETTERS, 2011, 3 (02) : 226 - 229
  • [10] Preparation of flexible ultra-fine Al2O3 fiber mats via the solution blowing method
    Li, Lei
    Kang, Weimin
    Zhao, Yixia
    Li, Yafang
    Shi, Jie
    Cheng, Bowen
    CERAMICS INTERNATIONAL, 2015, 41 (01) : 409 - 415