Effect of Substrate Bias on the Properties of Craln Films Prepared by High Power Pulsed Magnetron Sputtering

被引：0
|
作者：
Zhang, Hui [1 ]
Gong, Chunzhi [1 ]
Wang, Xiaobo [2 ]
Zhang, Weixin [1 ]
Tian, Xiubo [1 ]
机构：
[1] State Key Laboratory of advanced welding and joining, Harbin Institute of Technology, Harbin,150001, China
[2] Institute of Materials, China Academy of Engineering Physics, Mianyang,621900, China
来源：
Zhongguo Biaomian Gongcheng/China Surface Engineering | 2022年 / 35卷 / 05期
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摘要：
33
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页码：200 / 209
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