Effect of Bias Modes on Structures and Composition of CrN Films Prepared by High Power Pulsed Magnetron Sputtering

被引：0
|
作者：
Wu Zhongzhen [1 ]
Tian Xiubo [1 ]
Gong Chunzhi [1 ]
Yang Shiqin [1 ]
机构：
[1] Harbin Inst Technol, State Key Lab Adv Welding & Joining, Harbin 150001, Peoples R China
来源：
RARE METAL MATERIALS AND ENGINEERING | 2013年 / 42卷 / 02期
关键词：
high power pulsed magnetron sputtering; plasma ion implantation and deposition; bias; CrN; structure and composition; COPPER THIN-FILMS; HARD COATINGS; STEEL; MICROSTRUCTURE; ADHESION;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A new processing technique was proposed called High Power Pulsed Magnetron Sputtering-Plasma Ion Implantation & Deposition (HPPMS-PIID) based on High Power Pulsed Magnetron Sputtering (HPPMS) and Plasma-Based Ion Implantation & Deposition (PBII&D) processing. In this paper, CrN films were prepared by this technique and the surface morphologies, structure, composition and properties were studied compared with those of the CrN films fabricated by conventional HPPMS biased by DC-100 V and no bias. Once high voltage is applied, the film shows a smooth surface, very dense packed grains, and a discontinuous columnar structure. A highest intensity of CrN(200) preferential orientation and best adhesion were obtained by HPPMS-PIID due to the highly energetic ion implantation and bombardment. Compared with that of conventional HPPMS, high deposition rate was achieved in HPPMS-PIID since most ions were attracted into the sheath induced by negative high-voltage pulse, and consequently were deposited on the substrate.
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页码：405 / 409
页数：5
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