Cathodic arc deposited tetrahedral amorphous carbon as thin film contact pressure sensing material

被引:0
|
作者
Haikola, Juha [1 ]
Kolehmainen, Jukka [1 ]
Tervakangas, Sanna [1 ]
Tittonen, Ilkka [2 ]
机构
[1] Oerlikon Balzers Coating Finland Oy, Espoo 02330, Finland
[2] Aalto Univ, Dept Elect & Nanoengn, Micro & Quantum Syst MQS Grp, Espoo 02150, Finland
关键词
DIAMOND-LIKE CARBON;
D O I
10.1063/5.0220295
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Tetrahedral amorphous carbon (ta-C) film was deposited using the filtered pulsed cathodic arc deposition method. The ta-C structures deposited on high velocity oxygen fuel thermally sprayed steel beam substrates were investigated for piezoresistive properties under direct contact pressing. A load of up to 1.4 GPa was applied with point contact, with no detrimental influence on the material. The linear response for the strain applied homogeneously on the whole film surface and on the local portion of the film surface under a cylindrical contact was observed. A high gauge factor of the measured system of 305 was measured, showing the potential of the material as a good candidate for sensing applications on direct contact measurement devices.
引用
收藏
页数:5
相关论文
共 50 条
  • [41] Thermal stability of tetrahedral amorphous carbon films fabricated by filtered cathodic arc technique
    Qin Li-Zhao
    Zhang Xu
    Wu Zheng-Long
    Liu An-Dong
    Liao Bin
    JOURNAL OF INORGANIC MATERIALS, 2008, 23 (04) : 789 - 793
  • [42] Plasma diagnosis of tetrahedral amorphous carbon films by filtered cathodic vacuum arc deposition
    王明磊
    张林
    陆文琪
    林国强
    Plasma Science and Technology, 2023, 25 (06) : 101 - 107
  • [43] Cathodic arc deposition of tetrahedral amorphous carbon: Influence of process parameters on microstructure and hardness
    Camphausen, SM
    Myers, AF
    Bozeman, SP
    Baldwin, DA
    Cuomo, JJ
    COVALENTLY BONDED DISORDERED THIN-FILM MATERIALS, 1998, 498 : 135 - 140
  • [44] The effect of nitrogen pressure on cathodic arc deposited NbN thin films
    Cansever, N.
    Danisman, M.
    Kazmanli, K.
    SURFACE & COATINGS TECHNOLOGY, 2008, 202 (24): : 5919 - 5923
  • [45] THE STRUCTURE OF BORON-DOPED, PHOSPHORUS-DOPED AND NITROGEN-DOPED TETRAHEDRAL AMORPHOUS-CARBON DEPOSITED BY CATHODIC ARC
    DAVIS, CA
    YIN, Y
    MCKENZIE, DR
    HALL, LE
    KRAVTCHINSKAIA, E
    KEAST, V
    AMARATUNGA, GAJ
    VEERASAMY, VS
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1994, 170 (01) : 46 - 50
  • [46] Mechanical properties and Raman spectra of tetrahedral amorphous carbon films with high sp(3) fraction deposited using a filtered cathodic arc
    Xu, S
    Flynn, D
    Tay, BK
    Prawer, S
    Nugent, KW
    Silva, SRP
    Lifshitz, Y
    Milne, WI
    PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1997, 76 (03): : 351 - 361
  • [47] XPS and XAES studies of as grown and nitrogen incorporated tetrahedral amorphous carbon films deposited by pulsed unfiltered cathodic vacuum arc process
    Panwar, OS
    Aparna, Y
    Shivaprasad, SM
    Khan, MA
    Satyanarayana, BS
    Bhattacharyya, R
    APPLIED SURFACE SCIENCE, 2004, 221 (1-4) : 392 - 401
  • [48] Cell adhesion property of cathodic arc plasma deposited CrN thin film
    Sun Kyu Kim
    Vuong Hung Pham
    JOM, 2009, 61 : 59 - 62
  • [49] Cell adhesion property of cathodic arc plasma deposited CrN thin film
    Kim, Sun Kyu
    Pham, Vuong Hung
    JOM, 2009, 61 (09) : 59 - 62
  • [50] Influence of the nitrogen fraction on AlN thin film deposited by cathodic arc ion
    Khan, Shakil
    Ahmed, Ishaq
    Mehmood, Mazhar
    Sadiq, Gulfam
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2015, 29 : 193 - 200