The preliminary study of etching characteristics of atmospheric pressure trifluoromethane plasma jet etching

被引：0
|
作者：
Sung, Yu-Ching [1 ]
Yang, Wen-Lin [1 ]
Huang, Chun [1 ]
机构：
[1] Department of Chemical Engineering and Materials Science, Yuan Ze University, Taiwan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2024年 / 63卷 / 10期
关键词：
40;
D O I：
10.35848/1347-4065/ad82c5
中图分类号：
学科分类号：
摘要：
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