Correlated topological mixed-valence insulators in moiré heterobilayers

被引:0
|
作者
Mendez-Valderrama, Juan Felipe [1 ]
Kim, Sunghoon [1 ]
Chowdhury, Debanjan [1 ]
机构
[1] Cornell Univ, Dept Phys, Ithaca, NY 14853 USA
关键词
TRANSITION; FERMIONS; SURFACE; PHYSICS; STATES;
D O I
10.1103/PhysRevB.110.L201105
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Moir & eacute; transition metal dichalcogenide (TMD) materials provide an ideal playground for studying the combined interplay of strong interactions and band-topology over a range of electronic fillings. Here we investigate the panoply of interaction-induced electronic phases that arise at a total commensurate filling of nu T = 2 in moir & eacute; TMD heterobilayers, focusing specifically on their renormalized band-topology. We carry out a comprehensive self-consistent parton mean-field analysis on an interacting mixed-valence Hamiltonian describing AB-stacked MoTe2/WSe2 to highlight different ingredients that arise due to "Mottness," band-flattening, an enhanced excitonic tendency, and band inversion, leading to correlated topological semi-metals and insulators. We also propose a possible route towards realizing fractionalized insulators with emergent neutral fermionic excitations in this and other closely related platforms.
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页数:7
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