Microstructure and microhardness of Ti(C, N) and TiN/Ti(C, N) multilayer films

被引：0
|
作者：
Wang, Lei [1 ]
Dong, Shi-Run [1 ]
You, Jian-Fei [1 ]
Yu, Li-Hua [1 ]
Li, Xue-Mei [1 ]
Xu, Jun-Hua [1 ]
机构：
[1] Key Laboratory of Advanced Welding Technology, Institute of Material Science and Engineering, Jiangsu University of Science and Technology, Zhenjiang 212003, China
来源：
Cailiao Rechuli Xuebao/Transactions of Materials and Heat Treatment | 2010年 / 31卷 / 02期
关键词：
Sodium chloride - Film preparation - Modulation - Multilayers - Interfaces (materials) - Multilayer films - Carbon films - Composite films - Titanium nitride - Magnetrons - Titanium carbide - X ray diffraction - Microhardness - Tin;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Ti(C, N) and TiN/Ti(C, N) multilayer films were deposited on (100) silicon substrates by unbalanced magnetron (UMB) sputtering process. The films were characterized by X-ray diffraction (XRD) and micro-hardness test. The results show that the lattice parameters of Ti(C, N) film gradually increase and its microhardness first increases and then decreases with the increase of carbon content, the preferred orientiation of TiN/Ti(C, N) multilayer film depends on modulation period and thickness ratio of TiN film to Ti(C, N) film and microhardness of the films is enhanced in a modulation of 6~8 nm and Ti(C, N) thickness of 1~2 nm. Ti(C, N) and TiN/Ti(C, N) films are both of δ-NaCl structure. The microhardness increasing of Ti(C, N) thin films is because of solid solution. The strengthening of the multilayer films is due to the alternating stress field resulted from coherent strain of the interface between TiN and Ti(C, N) films.
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页码：113 / 118
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