Design and fabrication of MgF2 single-layer antireflection coating by glancing angle deposition

被引:12
|
作者
Gholizadeh M. [1 ]
Moghadam R.Z. [1 ]
Mohammadi A.A. [1 ]
Ehsani M.H. [1 ]
Dizaji H.R. [1 ]
机构
[1] Faculty of Physics, Semnan University, Semnan
关键词
Essential Macleod; filed emission scanning electron microscope; glancing angle deposition; MgF[!sub]2[!/sub] single-layers; physical vapour deposition; X-ray diffraction;
D O I
10.1080/14328917.2020.1723991
中图分类号
学科分类号
摘要
In this work, MgF2 single-layers are designed by the Essential Macleod program and prepared by physical vapour deposition (PVD) using the glancing angle deposition (GLAD) technique. The samples were prepared at 0°, 25°, 70°, and 80° deposition angles. The optical, morphological, and structural properties of the films studied by UV–VIS, field emission scanning electron microscope (FESEM), and X-ray diffraction (XRD). The crystallinity of the grown films decreased upon increasing deposition angle, which is characteristic of GLAD technique. A good agreement was found between optical transmission spectra of the designed and the deposited films. The refractive index of samples decreased from 1.46 to 1.29 as the deposition angle increased from 0° to 80°. The extinction coefficient of samples increased from 0.0027 to 0.0052 as the deposition angle increased from 0° to 80°. © 2020 Informa UK Limited, trading as Taylor & Francis Group.
引用
收藏
页码:442 / 446
页数:4
相关论文
共 50 条
  • [31] Efficiency improvement of buried contact solar cells using MgF2/CeO2 double layer antireflection coatings
    Lee, I
    Lim, DG
    Kim, KH
    Kim, SH
    Lee, SH
    Kim, DW
    Choi, EC
    Kim, DS
    Yi, J
    CONFERENCE RECORD OF THE TWENTY-EIGHTH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE - 2000, 2000, : 403 - 406
  • [32] Optimization of wide angle MgF2/ZnS/Al2O3 passivation and antireflection film for silicon solar cells
    Wang Lisheng
    Chen Fengxiang
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2012, 14 (11-12): : 929 - 934
  • [33] Optimization of The Thickness of Single-Layer Antireflection SiO2 Coating on a Silicon Photodiode Depending of the Characteristics of Incident Light
    Timofeev, A. V.
    Mil'shtein, A. I.
    Grigor'ev, D. N.
    OPTOELECTRONICS INSTRUMENTATION AND DATA PROCESSING, 2023, 59 (05) : 612 - 619
  • [34] REFLECTANCE OF A SINGLE-LAYER DIELECTRIC COATING FOR LIGHT INCIDENT AT AN ANGLE FOR TOTAL REFLECTION
    MINKOV, IM
    OPTICS AND SPECTROSCOPY-USSR, 1966, 21 (05): : 344 - &
  • [35] Design and fabrication of multilayer antireflection coating for optoelectronic devices by plasma enhanced chemical vapor deposition
    Yuan He
    Sun Chang-Zheng
    Xu Ban-Ming
    Wu Qing
    Xiong Bing
    Luo Yi
    ACTA PHYSICA SINICA, 2010, 59 (10) : 7239 - 7244
  • [36] Characterization of single LaF3 and MgF2 films on spherical substrate by planetary deposition
    Liu, Cunding
    Kong, Mingdong
    Li, Bincheng
    THIN SOLID FILMS, 2016, 612 : 296 - 302
  • [37] Fabrication of single-layer antireflective coating with environmental stability by modified SiO2 mixed sol
    Li X.
    Zheng Y.
    Xu X.
    Xue C.
    Han Z.
    Yang H.
    Zhang X.
    Colloids and Surfaces A: Physicochemical and Engineering Aspects, 2021, 630
  • [38] DESIGN AND FABRICATION OF 2 LAYER ANTIREFLECTION COATINGS FOR SEMICONDUCTOR OPTICAL AMPLIFIERS
    FARRIES, MC
    BUUS, J
    KEARLEY, M
    ELECTRONICS LETTERS, 1990, 26 (19) : 1626 - 1627
  • [39] Glancing angle intermediate layer deposition approach for CVD diamond coating of high-speed steel substrates
    Gaydaychuk, A.
    Linnik, S.
    Mitulinsky, A.
    Bulakh, V.
    Zenkin, S.
    SURFACES AND INTERFACES, 2024, 45
  • [40] Design and fabrication of multi-layer antireflection coating for III-V solar cell
    Jung, Sung-Mok
    Kim, Young-Hwan
    Kim, Seong-Il
    Yoo, Sang-Im
    CURRENT APPLIED PHYSICS, 2011, 11 (03) : 538 - 541