Overdense plasma production in a low-power microwave discharge electron source

被引：0
|
作者：
机构：
[1] Funaki, I.
[2] Kuninaka, H.
来源：
Funaki, I. | 1600年 / Japan Society of Applied Physics卷 / 40期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] A low-power, linear-geometry Hall plasma source with an open electron-drift
    Schmidt, DP
    Meezan, NB
    Hargus, WA
    Cappelli, MA
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2000, 9 (01): : 68 - 76
  • [22] Demonstration of fast-electron populations in a low-pressure, low-power, magnetized RF plasma source
    Jandovitz, P.
    Swanson, C.
    Matteucci, J.
    Oliver, R.
    Pearcy, J.
    Cohen, S. A.
    PHYSICS OF PLASMAS, 2018, 25 (03)
  • [23] Atmospheric pressure low-power microwave microplasma source for deactivation of microorganisms
    Mizeraczyk, Jerzy
    Dors, Miroslaw
    Jasinski, Mariusz
    Hrycak, Bartosz
    Czylkowski, Dariusz
    EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2013, 61 (02):
  • [24] LOW-POWER MICROWAVE NETWORK MEASUREMENTS BASED ON INTERCHANGE OF SOURCE AND DETECTOR
    ALTSCHUL.HM
    IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT, 1964, IM13 (04) : 355 - &
  • [25] LOW-POWER INDUCTIVELY COUPLED NITROGEN PLASMA DISCHARGE FOR SPECTROCHEMICAL ANALYSIS
    BARNES, RM
    MEYER, GA
    ANALYTICAL CHEMISTRY, 1980, 52 (09) : 1523 - 1525
  • [26] OVERDENSE PLASMA PRODUCTION USING ELECTRON-CYCLOTRON WAVES
    TANAKA, M
    NISHIMOTO, R
    HIGASHI, S
    HARADA, N
    OHI, T
    KOMORI, A
    KAWAI, Y
    JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1991, 60 (05) : 1600 - 1607
  • [27] LOW-POWER, 3.2-CM, EFFICIENT MICROWAVE ELECTRON-CYCLOTRON RESONANT ION-SOURCE
    MAHONEY, L
    DAHIMENE, M
    ASMUSSEN, J
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1988, 59 (03): : 448 - 452
  • [28] Potential for an atmospheric-pressure low-power microwave-induced plasma ionization source for mass spectrometry
    Vela, NP
    Caruso, JA
    Satzger, RD
    APPLIED SPECTROSCOPY, 1997, 51 (10) : 1500 - 1503
  • [29] A low-power 2.45 GHz microwave induced helium plasma source at atmospheric pressure based on microstrip technology
    Bilgiç, AM
    Voges, E
    Engel, U
    Broekaert, JAC
    JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY, 2000, 15 (06) : 579 - 580
  • [30] Uranium emission spectra with a low power microwave plasma source
    Duan, YX
    Scherrer, ST
    Koirala, SP
    Wang, CJ
    Winstead, CB
    ANALYTICA CHIMICA ACTA, 2005, 532 (01) : 47 - 54
12345