Simulation of electro-optic modulator based on optical waveguide formed by residual thermal stress-induced on Bi4Ge3O12 substrate by Si3N4 thin film

被引：0
|
作者：
Universidade de São Paulo-USP, Escola Politécnica, Av. Prof. Luciano Gualberto - Trav. 3, no 158, São Paulo, Brazil [1 ]
不详 [2 ]
机构：
来源：
J. Microwaves Optoelectron. Electromag. Appl. | 2013年 / SPL ISSU卷 / si18-si28期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Finite element method
引用
收藏
相关论文
共 33 条
  • [21] Orientation dependence of electrical properties for Bi4-xNdxTi3O12 (x=0.85) thin film deposited on p-type Si(100) substrate
    Yi, Seung Woo
    Kim, Sang Su
    Kim, Won-Jeong
    Do, Dalhyun
    APPLIED SURFACE SCIENCE, 2008, 255 (05) : 2710 - 2714
  • [22] RuO2/Ru electrode on Si3N4/Si substrate for microelectromechanical systems devices based on Pb(Zr1-xTix)O3 film and surface micromachining
    Yoon, YS
    Kim, JH
    Schmidt, AM
    Polla, DL
    Wang, Q
    Gladfelter, WL
    Shin, YH
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 1998, 9 (06) : 465 - 471
  • [23] RuO2/Ru electrode on Si3N4/Si substrate for microelectromechanical systems devices based on Pb(Zr1-xTix)O3 film and surface micromachining
    Y. S. Yoon
    J. H. Kim
    A. M. Schimidt
    D. L. Polla
    Q. Wang
    W. L. Gladfelter
    Y. H. Shin
    Journal of Materials Science: Materials in Electronics, 1998, 9 : 465 - 471
  • [24] Structure-related optical properties of Bi4-xLaxTi3O12 thin films grown on Pt/Ti/SiO2/Si substrate
    Hou, Yun
    Xue, Jianqiang
    Huang, Zhiming
    Li, Tianxin
    Ge, Yujian
    Chu, Junhao
    THIN SOLID FILMS, 2008, 517 (02) : 901 - 904
  • [25] Tuning LSPR of Thermal Spike-Induced Shape-Engineered Au Nanoparticles Embedded in Si3N4 Thin-Film Matrix for SERS Applications
    Malik, Pariksha
    Sarker, Debalaya
    Kumar, Dileep
    Schwartzkopf, Matthias
    Srivastava, Pankaj
    Ghosh, Santanu
    ACS APPLIED MATERIALS & INTERFACES, 2023, 15 (38) : 45426 - 45440
  • [26] Experiments and transient finite element simulation of γ-Y2Si2O7/B2O3Al2O3-SiO2 glass coating on porous Si3N4 substrate under thermal shock
    Fan, Xingyu
    Wang, Hongjie
    Niu, Min
    Zhang, Dahai
    Zhou, Jun
    Fan, Jinpeng
    CERAMICS INTERNATIONAL, 2018, 44 (04) : 4072 - 4079
  • [27] Structural and Electrical Properties of Mn-Doped Bi4Ti3O12 Thin Film Grown on TiN/SiO2/Si Substrate for RF MIM Capacitors
    Choi, Joo-Young
    Kang, Lee-Seung
    Cho, Kyung-Hoon
    Seong, Tae-Geun
    Nahm, Sahn
    Kang, Chong-Yun
    Yoon, Seok-Jin
    Kim, Jong-Hee
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2009, 56 (08) : 1631 - 1636
  • [28] EFFECTS OF THIN-FILM DEPOSITION RATES, AND PROCESS-INDUCED INTERFACIAL LAYERS ON THE OPTICAL-PROPERTIES OF PLASMA-DEPOSITED SIO2/SI3N4 BRAGG REFLECTORS
    STEPHENS, DJ
    HE, SS
    LUCOVSKY, G
    MIKKELSEN, H
    LEO, K
    KURZ, H
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (04): : 893 - 899
  • [29] CO2-LASER ANNEALING OF SI3N4, NB2O5, AND TA2O5 THIN-FILM OPTICAL-WAVEGUIDES TO ACHIEVE SCATTERING LOSS REDUCTION
    DUTTA, S
    JACKSON, HE
    BOYD, JT
    DAVIS, RL
    HICKERNELL, FS
    IEEE JOURNAL OF QUANTUM ELECTRONICS, 1982, 18 (04) : 800 - 806
  • [30] Improved optical transmittance and crystal characteristics of ZnS:TbOF thin film on Bi4Ti3O12/indium tin oxide/glass substrate by using a SiO2 buffer layer
    Chia, Wei-Kuo
    Yokoyama, Meiso
    Yang, Cheng-Fu
    Chiang, Wang-Ta
    Chen, Ying-Chung
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (07): : 5847 - 5852
1234