Structural and hydrophilic characteristics of N-doped TiOx films deposited by RF-magnetron sputtering

被引:0
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作者
Cheng, Chunyu [1 ]
Lin, Zeng [1 ,2 ]
Wang, Fang [1 ]
Li, Muqin [2 ]
机构
[1] Vacuum and Fluid Engineering Research Center, School of Mechanical Engineering & Automation, Northeastern University, Shenyang,110819, China
[2] Jiamusi University, Jiamusi,154007, China
关键词
Annealing temperatures - Change of particle-size - Heat treatment temperature - Hydrophilic characteristics - N-doped - Nitrogen-doped titanium oxides - rf-Magnetron sputtering - Water contact angle;
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页码:2232 / 2236
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