Highly accurate proximity effect correction for 100 kV electron projection lithography

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[1] Koba, Fumihiro
[2] Yamashita, Hiroshi
[3] Arimoto, Hiroshi
来源：
Koba, F. (koba@selete.co.jp) | 1600年 / Japan Society of Applied Physics卷 / 44期
关键词：
Lithography;
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