Fabrication of sub-micron structures with high aspect ratio for MEMS using deep X-ray lithography

被引：0

作者：

Ueno, Hiroshi ^{[1
]}

Nishi, Nobuyoshi ^{[1
]}

Sugiyama, Susumu ^{[1
]}

机构：

[1] Ritsumeikan Univ, Shiga, Japan

来源：

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS) | 2000年

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D O I：

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摘要：

引用

页码：596 / 601

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