High-mobility poly-Si thin film transistors fabricated on stainless-steel foils by low-temperature processes using sputter-depositions

被引：0
|
作者：
Serikawa, Tadashi [1 ]
Omata, Fujio [1 ]
机构：
[1] NTT Cyber Space Lab, Tokyo, Japan
来源：
| 2000年 / JJAP, Tokyo卷 / 39期
关键词：
Glow discharge sputtering;
D O I：
10.1143/jjap.39.l393
中图分类号：
学科分类号：
摘要：
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