Effect of Monofunctional Monomers on Rheological and Photosensitive Properties of Resin-Based Alumina Slurry for Stereolithography

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作者
Hu, Chuanqi [1 ]
Chen, Yufeng [1 ]
Huang, Xiaoting [1 ]
Liu, Hailin [1 ]
Gang, Boren [1 ]
Jia, Zhihui [1 ]
Huo, Yanli [1 ]
Yang, Taisheng [1 ]
Wang, Hua [1 ]
Li, Hui [1 ]
Sun, Haoran [1 ]
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[1] China Building Materials Academy Co., Ltd, Beijing,100024, China
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页码:1576 / 1582
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