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Anisotropic wet-chemical etching for preparation of freestanding films on Si substrates for atom probe tomography: A simple yet effective approach
被引:0
|作者:
Tkadletz, Michael
[1
]
Lechner, Alexandra
[2
]
Pölzl, Silvia
[1
]
Schalk, Nina
[1
]
机构:
[1] Department of Materials Science, Montanuniversität Leoben, Franz Josef-Straße 18, Leoben,8700, Austria
[2] Materials Center Leoben Forschung GmbH, Roseggerstraße 12, Leoben,8700, Austria
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