Preparation and sintering of silica-coated silicon carbide composite powder

被引:0
|
作者
Katsui H. [1 ]
He Z. [2 ]
Goto T. [1 ]
机构
[1] Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai
[2] Key Laboratory of Fiber Optic Sensing Technology and Information Processing, Ministry of Education, Wuhan University of Technology, Wuhan
来源
Katsui, Hirokazu (katsui@imr.tohoku.agc.jp) | 1600年 / Journal of the Japan Society of Powder and Powder Metallurgy, 15 Morimoto-cho Shimogamo, Sakyo-Ku Kyoto, Japan卷 / 63期
关键词
Chemical vapor deposition; Hardness; Silicon carbide; Spark plasma sintering; Toughness;
D O I
10.2497/jjspm.63.111
中图分类号
学科分类号
摘要
SiO2-coated SiC powders were prepared via rotary chemical vapor deposition and consolidated by spark plasma sintering. Thin amorphous SiO2 layers were deposited uniformly on SiC powders at 948 K at deposition time from 2.7 to 7.2 ks. The resultant SiO2-coated SiC powders were sintered, and the effects of the sintering temperature on the phase, morphology, relative density, and mechanical property were investigated. The SiO2-coated SiC sintered body fabricated at 1923 K was nearly fully densified, with a mosaic structure consisting of small SiC particles and a thin SiO2 matrix, and exhibited high hardness (HV = 17.1 GPa) and toughness (KIC = 8.4 MPa m1/2).
引用
收藏
页码:111 / 116
页数:5
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