Microstructure of polycrystalline silicon films formed through explosive crystallization induced by flash lamp annealing

被引:0
|
作者
Japan Advanced Institute of Science and Technology , 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan [1 ]
不详 [2 ]
机构
来源
Jpn. J. Appl. Phys. | 1600年 / 4 PART 2卷
关键词
Compendex;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [31] Crystallization behavior of electron-beam-evaporated amorphous silicon films on textured glass substrates by flash lamp annealing
    Yago, Aimi
    Ohdaira, Keisuke
    THIN SOLID FILMS, 2021, 728
  • [32] N-type polycrystalline silicon films formed on alumina by aluminium induced crystallization and overdoping
    Tuzun, O.
    Slaoui, A.
    Gordon, I.
    Focsa, A.
    Ballutaud, D.
    Beaucarne, G.
    Poortmans, J.
    THIN SOLID FILMS, 2008, 516 (20) : 6892 - 6895
  • [33] FLASH - LAMP ANNEALING OF BORON IMPLANTED SILICON
    GAIDUK, PI
    KOMAROV, FF
    PILIPENKO, VA
    SOLOVYEV, VS
    STERZHANOV, NI
    RADIATION EFFECTS LETTERS, 1984, 86 (06): : 205 - 211
  • [34] FLASH LAMP ANNEALING OF ARSENIC IMPLANTED SILICON
    KLABES, R
    MATTHAI, J
    VOELSKOW, M
    KACHURIN, GA
    NIDAEV, EV
    BARTSCH, H
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1981, 66 (01): : 261 - 266
  • [35] Variation of crystallization mechanisms in flash-lamp-irradiated amorphous silicon films
    Ohdaira, Keisuke
    Nishikawa, Takuya
    Matsumura, Hideki
    JOURNAL OF CRYSTAL GROWTH, 2010, 312 (19) : 2834 - 2839
  • [36] Polycrystalline Silicon Thin-Film Transistor Using Xe Flash-Lamp Annealing
    Saxena, Saurabh
    Kim, Dong Cheol
    Park, Jeang Hun
    Jang, Jin
    IEEE ELECTRON DEVICE LETTERS, 2010, 31 (11) : 1242 - 1244
  • [37] Flash-lamp-crystallized polycrystalline silicon films with high hydrogen concentration formed from Cat-CVD a-Si films
    Ohdaira, Keisuke
    Tomura, Naohito
    Ishii, Shohei
    Matsumura, Hideki
    THIN SOLID FILMS, 2011, 519 (14) : 4459 - 4461
  • [38] THE STRUCTURE OF NANOCRYSTALLINE SILICON FORMED BY LASER-INDUCED EXPLOSIVE CRYSTALLIZATION
    SINKE, WC
    WARABISAKO, T
    MIYAO, M
    TOKUYAMA, T
    ROORDA, S
    APPLIED SURFACE SCIENCE, 1989, 36 (1-4) : 460 - 470
  • [39] MICROSTRUCTURE OF POLYCRYSTALLINE SILICON FILMS OBTAINED BY COMBINED FURNACE AND LASER ANNEALING
    CARLUCCIO, R
    STOEMENOS, J
    FORTUNATO, G
    MEAKIN, DB
    BIANCONI, M
    APPLIED PHYSICS LETTERS, 1995, 66 (11) : 1394 - 1396
  • [40] Polycrystalline silicon thin films by aluminum induced crystallization of amorphous silicon
    Wang, T.
    Yan, H.
    Zhang, M.
    Song, X.
    Pan, Q.
    He, T.
    Hu, Z.
    Jia, H.
    Mai, Y.
    APPLIED SURFACE SCIENCE, 2013, 264 : 11 - 16