Effects of substrate temperature on the properties of N-doped p-type ZnO films deposited by DC reactive sputtering

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Institute for Microsystem of Physics, School of Physics and Electrics, Henan University, Kaifeng 475004, China [1 ]
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Rengong Jingti Xuebao | 2007年 / 5卷 / 1132-1135期
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页码：1132 / 1135
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