Defect printability for 100 nm patterns in X-ray lithography

被引：0
|
作者：
Watanabe, H. [1 ]
Marumoto, K. [1 ]
Matsui, Y. [1 ]
机构：
[1] Super-fine SR Lithography Lab., Asoc. Super-Adv. Electron. Technol., NTT Telecom. Energy Lab., 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2001年 / 40卷 / 2 A期
关键词：
D O I：
10.1143/jjap.40.457
中图分类号：
学科分类号：
摘要：
13
引用
收藏
页码：457 / 461
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