Effects of hydrogen dilution ratio on properties of hydrogenated nanocrystalline cubic silicon carbide films deposited by very high-frequency plasma-enhanced chemical vapor deposition

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作者：
Miyajima, Shinsuke [1 ]
Sawamura, Makoto [1 ]
Yamada, Akira [2 ]
Konaga, Makoto [1 ]
机构：
[1] Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1-S9-9 O-okayama, Meguro-ku, Tokyo 152-8552, Japan
[2] Quantum Nanoelectronics Research Center, Tokyo Institute of Technology, 2-12-1-S9-9 O-okayama, Meguro-ku, Tokyo 152-8552, Japan
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| 1600年 / Japan Society of Applied Physics, 1-12-3 Kudan-Kita,k Chiyoda-ku, Tokyo, 102, Japan卷 / 46期
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页码：25 / 28
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