Characterization of ZnO:Al films deposited on organic substrate by r.f. magnetron sputtering

被引：0
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作者：
Ma, Jin [1 ]
Hao, Xiaotao [1 ]
Zhang, Shiyong [2 ]
Ma, Honglei [1 ]
机构：
[1] Sch. of Phys. and Microelectronics, Inst. of Optoelectron. Mat., Shandong Univ., Ji'nan 250100, China
[2] Inst. of Sci., Chang An Univ., Xi'an 710064, China
来源：
Journal of Materials Science and Technology | 2003年 / 19卷 / 04期
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摘要：
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页码：363 / 365
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