共 50 条
- [32] Determination of native oxide removal in a cluster compatible dry cleaning system using photovoltage technique [J]. CLEANING TECHNOLOGY IN SEMICONDUCTOR DEVICE MANUFACTURING V, 1998, 35 : 408 - 414
- [33] Thermomechanical Resist Removal-Cleaning System Using Cryogenic Micro-Slush Jet [J]. ULTRA CLEAN PROCESSING OF SEMICONDUCTOR SURFACES X, 2012, 187 : 145 - +
- [34] Hydrogen sulfide removal from simulated synthesis gas using a hot gas cleaning system [J]. JOURNAL OF ENVIRONMENTAL CHEMICAL ENGINEERING, 2023, 11 (02):
- [39] Development of a Method to Determine the Effectiveness of Cleaning Agents in Removal of Biofilm Derived Spores in Milking System [J]. FRONTIERS IN MICROBIOLOGY, 2016, 7