In-situ spectroscopic ellipsometry and structural study of HfO2 thin films deposited by radio frequency magnetron sputtering

被引：0
|
作者：
机构：
[1] Cantas, Ayten
[2] Aygun, Gulnur
[3] Basa, Deepak Kumar
来源：
Aygun, G. (gulnuraygun@iyte.edu.tr) | 1600年 / American Institute of Physics Inc.卷 / 116期
关键词：
Silicon oxides - Substrates - Spectroscopic ellipsometry - X ray diffraction - Crystalline materials - Interfaces (materials) - Depth profiling - Fourier transform infrared spectroscopy - Silica - Indium compounds - Magnetron sputtering - Hafnium oxides - Silicon - Buffer layers - Gate dielectrics;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] HfO2-Based Thin Films Deposited by RF Magnetron Sputtering
    Khomenkova, L.
    Dufour, C.
    Coulon, P. -E.
    Bonafos, C.
    Gourbilleau, F.
    MATERIALS AND PHYSICS FOR NONVOLATILE MEMORIES, 2009, 1160 : 69 - +
  • [22] Gallium nitride thin films deposited by radio-frequency magnetron sputtering
    Maruyama, Toshiro
    Miyake, Hidetomo
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2006, 24 (04): : 1096 - 1099
  • [23] Properties of TaSiN thin films deposited by reactive radio frequency magnetron sputtering
    Mesic, Biljana
    Schroeder, Herbert
    THIN SOLID FILMS, 2012, 520 (13) : 4497 - 4500
  • [24] Structural and nanomechanical properties of BiFeO3 thin films deposited by radio frequency magnetron sputtering
    Sheng-Rui Jian
    Huang-Wei Chang
    Yu-Chin Tseng
    Ping-Han Chen
    Jenh-Yih Juang
    Nanoscale Research Letters, 8
  • [25] Structural and nanomechanical properties of BiFeO3 thin films deposited by radio frequency magnetron sputtering
    Jian, Sheng-Rui
    Chang, Huang-Wei
    Tseng, Yu-Chin
    Chen, Ping-Han
    Juang, Jenh-Yih
    NANOSCALE RESEARCH LETTERS, 2013, 8
  • [26] IN-SITU SPECTROSCOPIC ELLIPSOMETRY STUDIES OF INTERFACES OF THIN-FILMS DEPOSITED BY PECVD
    DREVILLON, B
    THIN SOLID FILMS, 1994, 241 (1-2) : 234 - 239
  • [27] Compositional and structural properties of TiO2-xNx thin films deposited by radio-frequency magnetron sputtering
    Key Laboratory of Excited State Processes, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
    不详
    不详
    Chin. Phys. Lett., 2006, 3 (682-685):
  • [28] Compositional and structural properties of TiO2-xNx thin films deposited by radio-frequency magnetron sputtering
    Jing, SW
    Liu, YC
    Liang, Y
    Ma, JG
    Lu, YM
    Shen, DZ
    Zhang, JY
    Fan, XW
    Mu, RX
    CHINESE PHYSICS LETTERS, 2006, 23 (03) : 682 - 685
  • [29] Current conduction mechanisms in HfO2 and SrHfON thin films prepared by magnetron sputtering
    Li-ping Feng
    Ning Li
    Hao Tian
    Zheng-tang Liu
    Journal of Materials Science, 2014, 49 : 1875 - 1881
  • [30] Current conduction mechanisms in HfO2 and SrHfON thin films prepared by magnetron sputtering
    Feng, Li-ping
    Li, Ning
    Tian, Hao
    Liu, Zheng-tang
    JOURNAL OF MATERIALS SCIENCE, 2014, 49 (04) : 1875 - 1881
12345