Influence of defects in SiOx thin films on their barrier properties

被引：0
|
作者：
Grüniger, A. [1 ]
Von Rohr, Ph. Rudolf [1 ]
机构：
[1] Swiss Fed. Inst. of Technol. Zurich, Institute of Process Engineering, CH-8092 Zurich, Switzerland
来源：
Thin Solid Films | / 1-2卷 / 308-312期
关键词：
Compendex;
D O I：
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学科分类号：
摘要：
Composite materials - Crack initiation - Deposition - Diffusion - Laminates - Packaging materials - Plastic films - Silica
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