Synergy between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers

被引：19

作者：

Starostin S.A. ^{[1
]}

Keuning W. ^{[2
]}

Schalken J.-P. ^{[2
]}

Creatore M. ^{[2
,3
]}

Kessels W.M.M.E. ^{[2
,3
]}

Bouwstra J.B. ^{[4
]}

Richard Van De Sanden M.C.M. ^{[2
]}

De Vries H.W. ^{[1
]}

机构：

[1] Dutch Institute for Fundamental Energy Research (DIFFER), P.O. Box 6336, Eindhoven

[2] Department of Applied Physics, Plasma and Materials Processing Group, Eindhoven University of Technology, P.O. Box 513, Eindhoven

[3] Solliance Solar Research, High Tech Campus 5, Eindhoven

[4] FUJIFILM Manufacturing Europe B.V., P.O. Box 90156, Tilburg

来源：

Plasma Processes and Polymers | 2016年 / 13卷 / 03期

关键词：

gas permeation; plasma-assisted atomic layer deposition (PA-ALD); plasma-enhanced chemical vapor deposition (PE-CVD); roll-to-roll reactors;

D O I：

10.1002/ppap.201500096

中图分类号：

学科分类号：

摘要：

The synergy between fast (1600 nm · min-1), roll-to-roll plasma-enhanced chemical vapor deposited (PE-CVD) SiO2 layers and plasma-assisted atomic layer deposited (PA-ALD) ultra-thin Al2O3 films has been investigated in terms of moisture permeation barrier properties. The effective and intrinsic water vapor transmission rates (WVTR) were studied as a function of the number of ALD cycles. It was demonstrated that a synergistic combination of a silica buffer layer deposited on polymer with an ultra-thin (≤ 2 nm) alumina barrier film can provide excellent intrinsic (10-5-10-6 g · m-2 · day-1) and good effective (∼10-3 g · m-2 · day-1) WVTR values, whereas both single layers individually exhibit poor barrier performances with effective WVTR values of ≥ 1.0 g · m-2 · day-1. The article studies synergistic effect in combining industrially compatible roll-to-roll atmospheric pressure PE-CVD and plasma-assisted ALD technologies for moisture barrier fabrication on polyethylene 2,6 naphthalate (PEN) polymer. It is demonstrated that enhancement of polymer substrate with silica-like PE-CVD buffer layer enables ultra-thin Al2O3 barrier films produced already by 10-15 plasma-assisted ALD cycles. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

引用

页码：311 / 315

页数：4