Investigation of compatibility of ferroelectric capacitor fabrication process with standard CMOS fabrication process

被引：0
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作者：
Zhai, Ya-Hong [1 ]
Li, Ping [1 ]
Zhang, Shu-Ren [1 ]
Yang, Cheng-Tao [1 ]
Ruan, Ai-Wu [1 ]
Cai, Dao-Lin [1 ]
Ouyang, Fan [1 ]
Chen, Yan-Yu [1 ]
机构：
[1] State Key Lab. of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China
来源：
| 2007年 / Sichuan Institute of Piezoelectric and Acoustooptic Technology, Yongchuan Chongqing, 632164, China卷 / 29期
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