Ellipsometric study of polycrystalline silicon films prepared by low-pressure chemical vapor deposition

被引:0
|
作者
机构
来源
| 1734年 / American Institute of Physics Inc.卷 / 87期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] Ellipsometric study of polycrystalline silicon films prepared by low-pressure chemical vapor deposition
    Petrik, P
    Lohner, T
    Fried, M
    Biró, LP
    Khánh, NQ
    Gyulai, J
    Lehnert, W
    Schneider, C
    Ryssel, H
    JOURNAL OF APPLIED PHYSICS, 2000, 87 (04) : 1734 - 1742
  • [2] CHARACTERIZATION OF SEMIINSULATING POLYCRYSTALLINE SILICON PREPARED BY LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION
    CHAO, TS
    LEE, CL
    LEI, TF
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1993, 140 (09) : 2645 - 2648
  • [3] The kinetics of the low-pressure chemical vapor deposition of polycrystalline silicon from silane
    Weerts, WLM
    de Croon, MHJM
    Marin, GB
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1998, 145 (04) : 1318 - 1330
  • [4] THE GROWTH OF POLYCRYSTALLINE SILICON FILMS BY LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION AT RELATIVELY LOW-TEMPERATURES
    MEAKIN, D
    MIGLIORATO, P
    STOEMENOS, J
    ECONOMOU, NA
    THIN SOLID FILMS, 1988, 163 : 249 - 254
  • [5] DEPOSITION AND PROPERTIES OF LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITED POLYCRYSTALLINE SILICON-GERMANIUM FILMS
    KING, TJ
    SARASWAT, KC
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1994, 141 (08) : 2235 - 2241
  • [6] AMORPHOUS-SILICON PREPARED BY LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION
    MANFREDOTTI, C
    THIN SOLID FILMS, 1986, 141 (02) : 171 - 178
  • [7] PROPERTIES OF SILICON DIOXIDE FILMS PREPARED BY LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION FROM TETRAETHYLORTHOSILICATE
    ROJAS, S
    MODELLI, A
    WU, WS
    BORGHESI, A
    PIVAC, B
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (06): : 1177 - 1184
  • [8] PRESSURE-DEPENDENCE OF THE GROWTH OF POLYCRYSTALLINE SILICON BY LOW-PRESSURE CHEMICAL-VAPOR DEPOSITION
    MEAKIN, D
    PAPADOPOULOU, K
    FRILIGKOS, S
    STOEMENOS, J
    MIGLIORATO, P
    ECONOMOU, NA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (06): : 1547 - 1550
  • [9] ZnS thin films prepared by low-pressure metalorganic chemical vapor deposition
    Li, Jiin Wen, 1600, JJAP, Minato-ku, Japan (33):
  • [10] GROWTH OF POLYCRYSTALLINE CdS FILMS BY LOW-PRESSURE METALORGANIC CHEMICAL VAPOR DEPOSITION.
    Yamaga, Shigeki
    Yoshikawa, Akihiko
    Kasai, Haruo
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes, 1987, 26 (07): : 1002 - 1007