Improved Color Defect Detection with Machine Learning for after Develop Inspections in Lithography

被引：0

作者：

McLaughlin, Matthew P. ^{[1
]}

Mennell, Petra ^{[1
]}

Stamper, Andrew ^{[1
]}

Barber, Gabriel ^{[1
]}

Paduano, Janice ^{[1
]}

Benn, Emerson ^{[1
]}

Linnane, Michael ^{[1
]}

Zwick, Justin ^{[1
]}

Khatumria, Chetan ^{[1
]}

Isaacson, Robert L. ^{[1
]}

Hoffman, Nathan ^{[1
]}

Menser, Clayton ^{[1
]}

机构：

[1] Globalfoundries, Hopewell Junction,NY,12533, United States

来源：

IEEE Transactions on Semiconductor Manufacturing | 2022年 / 35卷 / 03期

关键词：

Compendex;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Image enhancement

引用

页码：418 / 424

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