Improved Color Defect Detection with Machine Learning for after Develop Inspections in Lithography

被引：0
|
作者：
McLaughlin, Matthew P. [1 ]
Mennell, Petra [1 ]
Stamper, Andrew [1 ]
Barber, Gabriel [1 ]
Paduano, Janice [1 ]
Benn, Emerson [1 ]
Linnane, Michael [1 ]
Zwick, Justin [1 ]
Khatumria, Chetan [1 ]
Isaacson, Robert L. [1 ]
Hoffman, Nathan [1 ]
Menser, Clayton [1 ]
机构：
[1] Globalfoundries, Hopewell Junction,NY,12533, United States
来源：
IEEE Transactions on Semiconductor Manufacturing | 2022年 / 35卷 / 03期
关键词：
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摘要：
Image enhancement
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页码：418 / 424
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