Effect of sputtering power on microstructure and corrosion properties of TiO2 films deposited by reactive magnetron sputtering

被引：0
|
作者：
Wang, Bo [1 ]
Wei, Shicheng [1 ]
Guo, Lei [1 ]
Wang, Yujiang [1 ]
Liang, Yi [1 ]
Huang, Wei [2 ]
Lu, Fangjie [1 ]
Chen, Xianhua [3 ]
Pan, Fusheng [3 ]
Xu, Binshi [1 ]
机构：
[1] National Key Laboratory for Remanufacturing, Army Academy of Armored Forces, Beijing,100072, China
[2] Department of Naval Architecture Engineering, Naval University of Engineering, Wuhan,430033, China
[3] College of Materials Science and Engineering, Chongqing University, Chongqing,400045, China
来源：
Journal of Materials Research and Technology | 2022年 / 19卷
基金：
中国国家自然科学基金;
关键词：
Anti-corrosion - Anti-foulings - Antibacterial properties - Antifouling property - Corrosion property - Microstructures properties - Power - Reactive magnetron sputtering - Sputtering power - TiO 2 films;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The effect of sputtering power on the microstructure, anti-corrosion and anti-fouling properties of TiO2 films deposited on 5083 aluminum (Al) alloy by reactive magnetron sputtering at room temperature were investigated systematically. The results show that the TiO2 film mainly consists of anatase, and it is composed of spherical shaped and pyramidal particles. Both the anti-corrosion and anti-bacterial properties first improve with increasing sputter power. As the power is 12 kW, the combination of anti-corrosion and anti-bacterial properties is the best, the corrosion potential (Ecorr), current density (Icorr), polarization resistance (Rp) and density of bacteria are −0.25 V, 0.36 μA/cm2, 2255.5 Ω/cm2 and 73 cell/mm2, respectively. © 2022 The Author(s)
引用
收藏
页码：2171 / 2178
相关论文
共 50 条
  • [1] Original Effect of sputtering power on microstructure and corrosion properties of TiO2 films deposited by reactive magnetron sputtering
    Wang, Bo
    Wei, Shicheng
    Guo, Lei
    Wang, Yujiang
    Liang, Yi
    Huang, Wei
    Lu, Fangjie
    Chen, Xianhua
    Pan, Fusheng
    Xu, Binshi
    [J]. JOURNAL OF MATERIALS RESEARCH AND TECHNOLOGY-JMR&T, 2022, 19 : 2171 - 2178
  • [2] Effect of deposition parameters on properties of TiO2 films deposited by reactive magnetron sputtering
    Wang, Bo
    Wei, Shicheng
    Guo, Lei
    Wang, Yujiang
    Liang, Yi
    Xu, Binshi
    Pan, Fusheng
    Tang, Aitao
    Chen, Xianhua
    [J]. CERAMICS INTERNATIONAL, 2017, 43 (14) : 10991 - 10998
  • [3] Microstructure and optical properties of TiO2 films prepared by reactive MF magnetron sputtering
    Duan Yongli
    Xu Sheng
    Ba Dechun
    Fan Chuizhen
    [J]. Vacuum Metallurgy and Surface Engineering, Proceedings, 2007, : 131 - 135
  • [4] The Influence of the Power Supply of a Magnetron Sputtering System on the Properties of the Deposited TiO2 Films
    Abramov, N. F.
    Bezrukov, A. V.
    Vol'pyan, O. D.
    Obod, Yu. A.
    [J]. INORGANIC MATERIALS, 2018, 54 (15) : 1491 - 1497
  • [5] The Influence of the Power Supply of a Magnetron Sputtering System on the Properties of the Deposited TiO2 Films
    N. F. Abramov
    A. V. Bezrukov
    O. D. Vol’pyan
    Yu. A. Obod
    [J]. Inorganic Materials, 2018, 54 : 1491 - 1497
  • [6] Properties of TiO2 thin films deposited by RF magnetron sputtering
    Sima, C.
    Waldhauser, W.
    Lackner, J.
    Kahn, M.
    Nicolae, I.
    Viespe, C.
    Grigoriu, C.
    Manea, A.
    [J]. JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2007, 9 (05): : 1446 - 1449
  • [7] Properties of TiO2 thin films deposited by rf reactive magnetron sputtering on biased substrates
    Nezar, Sawsen
    Saoula, Nadia
    Sali, Samira
    Faiz, Mohammed
    Mekki, Mogtaba
    Laoufi, Nadia Aicha
    Tabet, Nouar
    [J]. APPLIED SURFACE SCIENCE, 2017, 395 : 172 - 179
  • [8] Effect of sputtering pressure and post-annealing on hydrophilicity of TiO2 thin films deposited by reactive magnetron sputtering
    Liao, M. C.
    Niu, H.
    Chen, G. S.
    [J]. THIN SOLID FILMS, 2010, 518 (24) : 7258 - 7262
  • [9] Influences of annealing temperature on microstructure and properties for TiO2 films deposited by DC magnetron sputtering
    Shang, Jie-Ting
    Chen, Chih-Ming
    Cheng, Ta-Chih
    Lee, Ying-Chieh
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2015, 54 (12)
  • [10] Effect of post annealing on properties of N-doped TiO2 films deposited by reactive magnetron sputtering
    Sun, Zhilei
    Evdokimov, K. E.
    Konishchev, M. E.
    Kuzmin, O. S.
    Pichugin, V. F.
    [J]. 14TH INTERNATIONAL CONFERENCE ON FILMS AND COATINGS, 2019, 1281
12345