Thermally induced interface chemistry in Mo/B4C/Si/B 4C multilayered films

被引：0
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作者：
Nyabero, S.L. [1 ]
Van De Kruijs, R.W.E. [1 ]
Yakshin, A.E. [1 ]
Zoethout, E. [1 ]
Bijkerk, F. [1 ,2 ]
机构：
[1] FOM Dutch Institute for Fundamental Energy Research (DIFFER), P.O. Box 1207, 3430 BE Nieuwegein, Netherlands
[2] MESA Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, Netherlands
来源：
Journal of Applied Physics | 2012年 / 112卷 / 05期
关键词：
This work is part of the research programme Controlling photon and plasma induced processes at EUV optical surfaces (CP3E) of the Stichting voor Fundamenteel Onderzoek der Materie (FOM); which is financially supported by the Nederlandse Organisatie voor Wetenschappelijk Onderzoek (NWO). The CP3E programme is co-financed by Carl Zeiss SMT and ASML. We also acknowledge financial support from Agentschap NL (EXEPT project);
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摘要：
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