Oxidation resistance of Ti-Si-N and Ti-Al-Si-N films deposited by reactive sputtering using alloy targets

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Graduate School of Science and Engineering, Aoyama Gakuin University, Sagamihara 252-5258, Japan [1 ]
不详 [2 ]
不详 [3 ]
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Jpn. J. Appl. Phys. | / 7 PART 1卷
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Engineering Village;
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摘要：
Electron probe microanalyses - High hardness - High temperature - Nano-composite structure - Post annealing - Post-annealing temperature - Reactive magnetron sputtering - Ti-Al-Si-N films
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