Epitaxial growth of high-tech perovsky-phased films by off-axis magnetron sputtering

被引：0

作者：

Yu, Guo ^{[1
]}

Bai, Feiming ^{[1
]}

Wen, Dandan ^{[1
]}

Zhang, Huaiwu ^{[1
]}

机构：

[1] State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology, Chengdu 610054, China

来源：

Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology | 2013年 / 33卷 / 06期

关键词：

Development trends - Film materials - Growth techniques - High temperature superconducting - Off-axis - Re-sputtering - Secondary electrons - Sputtering technology;

D O I：

10.3969/j.issn.1672-7126.2013.06.14

中图分类号：

学科分类号：

摘要：

The latest progress in the epitaxial growth of perovsky-phased films by off-axis magnetron sputtering, especially in deposition of the advanced, high-tech film materials, was tentatively reviewed in a thought provoking way. The discussions with specific examples focused on: i) the development trends of the off-axis magnetron sputtering technology; ii) the many advantages of the off-axis magnetron sputtering over other conventional epitaxial growth techniques, for instance, a significant reduction of the impact of re-sputtering originated from secondary electrons and negative ions; and iii) the wide applications of the conventional off-axis magnetron sputtering in epitaxial growth of a variety of advanced film-materials, such as the high temperature superconducting (YBa2Cu3O7-x, YBCO), piezoelectric ceramics (Pb(ZrTi)O3), and ferroelectric ceramics (BiFeO3) materials.

引用

页码：578 / 585

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