InNAsSb single crystals with cutoff wavelength of 11-13.5 μm grown by melt epitaxy

被引:0
|
作者
Gao, Yu Zhu [1 ]
Yamaguchi, Tomuo [2 ]
Gong, Xiu Ying [1 ]
Kan, Hirofumi [3 ]
Aoyama, Mitsuru [2 ]
Dai, Ning [1 ]
机构
[1] Gao, Yu Zhu
[2] Yamaguchi, Tomuo
[3] Gong, Xiu Ying
[4] Kan, Hirofumi
[5] Aoyama, Mitsuru
[6] Dai, Ning
来源
Gao, Y.Z. | 1600年 / Japan Society of Applied Physics卷 / 42期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:4203 / 4206
相关论文
共 50 条
  • [1] InNAsSb single crystals with cutoff wavelength of 11-13.5 μm grown by melt epitaxy
    Gao, YZ
    Yamaguchi, T
    Gong, XY
    Kan, H
    Aoyama, M
    Dai, N
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2003, 42 (7A): : 4203 - 4206
  • [2] InAsSb single crystals with cutoff wavelength longer than 10μm grown by melt epitaxy
    Gao, YZ
    Gong, XY
    Fang, WZ
    Xu, FF
    Wu, J
    Dai, N
    JOURNAL OF INFRARED AND MILLIMETER WAVES, 2004, 23 (06) : 405 - 407
  • [3] High purity InxGa1−xSb single crystals with cutoff wavelength of 7–8 µm grown by melt epitaxy
    Yu Zhu Gao
    Hirofumi Kan
    Jun Ichi Murata
    Mitsuru Aoyama
    Tomuo Yamaguchi
    Journal of Electronic Materials, 2000, 29 : L25 - L27
  • [4] High quality InAs0.04Sb0.96/GaAs single crystals with a cutoff wavelength of 12 μm grown by melt epitaxy
    Gao, YZ
    Gong, XY
    Chen, YH
    Yamaguchi, T
    ICO20: MATERIALS AND NANOSTRUCTURES, 2006, 6029
  • [5] High purity InxGa1-xSb single crystals with cutoff wavelength of 7-8 μm grown by melt epitaxy
    Gao, YZ
    Kan, H
    Murata, JI
    Aoyama, M
    Yamaguchi, T
    JOURNAL OF ELECTRONIC MATERIALS, 2000, 29 (10) : L25 - L27
  • [6] Optical properties of InAsSb single crystals with cutoff wavelengths of 8-12μm grown by melt-epitaxy
    Gao, Yu Zhu
    Going, Xiu Ying
    Yamaguchi, Tormlo
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (07): : 5732 - 5734
  • [7] Optical properties of InAsSb single crystals with cutoff wavelengths of 8-12 μm grown by melt-epitaxy
    Gao, Yu Zhu
    Gong, Xiu Ying
    Yamaguchi, Tomuo
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2006, 45 (07): : 5732 - 5734
  • [8] Electrical properties of melt-epitaxy-grown InAs0.04Sb0.96 layers with cutoff wavelength of 12 μm
    Gao, Yu-Zhu
    Gong, Xiu-Ying
    Liang, Jun-Wu
    Gui, Yong-Sheng
    Tomuo, Yamaguchi
    Guangdianzi Jiguang/Journal of Optoelectronics Laser, 2005, 16 (11): : 1329 - 1332
  • [9] Electrical properties of melt-epitaxy-grown InAs0.04Sb0.96 layers with cutoff wavelength of 12 μm
    Gao, YZ
    Gong, XY
    Gui, YS
    Yamaguchi, T
    Dai, N
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2004, 43 (03): : 1051 - 1054
  • [10] InAs1-ySby single crystals with cutoff wavelength of 8-12 μm grown by a new method
    Gao, YZ
    Gong, XY
    Kan, H
    Aoyama, M
    Yamaguchi, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (4A): : 1939 - 1940