Space charge characteristics of an insulating thin film negatively charged by a low-energy electron beam

被引：0
|
作者：
Key Laboratory for Physical Electronics and Devices, The Ministry of Education, Department of Electronic Science and Technology, Xi’an Jiaotong University, Xi’an [1 ]
710049, China
不详 [2 ]
710048, China
机构：
来源：
Microsc. | / 2卷 / 85-97期
基金：
中国国家自然科学基金;
关键词：
Engineering Village;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Focused electron beams - Insulating thin films - Low energy electron beams - Low energy electron irradiation - Negative charging - Negatively charged - Potential barriers - Potential range - Space-charge characteristics - Space-charge distribution
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