Impact of Xe partial pressure on the production of excimer vacuum ultraviolet emission for plasma display panels

被引:0
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作者
Zhu, Di [1 ,2 ]
Zhang, Xiong [1 ]
Kajiyama, Hiroshi [2 ]
机构
[1] Display RD Center, School of Electronic Science and Engineering, Southeast University, Nanjing, China
[2] Graduate School of Advanced Science of Matter, Hiroshima University, Higashi-Hiroshima, Hiroshima, Japan
来源
Journal of Applied Physics | 2012年 / 112卷 / 03期
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Number:; -; Acronym:; NEDO; Sponsor: New Energy and Industrial Technology Development Organization;
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摘要
In this work, the effect of the Xe partial pressure on the excimer vacuum ultraviolet (VUV) emission intensity of the plasma display panels is investigated, both by measuring the spectral emission directly and by two-dimensional simulations. Experimentally, we find that at the high Xe partial pressure levels, there is an supra-linear increase of excimer VUV radiation and that determines the strong increase of luminance at the high pressures and high voltage. Due to the increase of the luminance and the almost unchanged discharge current, the luminous efficacy strongly increases with the Xe partial pressure. In addition, we also investigated the dynamics of the VUV generation, by measuring the decay time of the excimer VUV light as a function of the gas pressure. It is found that the decay time decreases with the increase of gas pressure. The spatial characteristics of the excimer VUV emission are also discussed. Different from the Ne and near-infrared emission, the excimer VUV emission is generated near the surface of the electrodes and increases uniformly on both sides of the anode and cathode (i.e., the bulk plasma region). Most importantly, it is found that the VUV production occurs during the afterglow period, while it is almost zero at the moment of the discharge itself. From the simulations, it can be seen that the Xe2(3Σ u+) excimer species, which are generated from Xe(1s 5), play a dominant role in the excimer VUV emission output at the high Xe partial pressure. The two-dimensional simulations also show that the strong increase of Xe excimer excitation states in the case of high pressure is mainly the result of the high conversion efficiency of the Xe excimer states, especially in the afterglow period. Due to the high conversion efficiency of Xe excitation species to Xe excimer species by the high collision rate in the case of high pressure, there is a strong increase of excimer VUV production, especially from the cathode. © 2012 American Institute of Physics.
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