Stability of 180° domain in ferroelectric thin films

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作者：
Wang, Biao [1 ,2 ]
Woo, C.H. [1 ]
机构：
[1] Department of Mechanical Engineering, Hong Kong Polytechnic University, Hung Hom, Hong Kong
[2] Harbin Institute of Technology, Harbin, China
来源：
| 1600年 / American Institute of Physics Inc.卷 / 94期
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