Recent Advances in Metal-Oxide-Based Photoresists for EUV Lithography

被引：0
|
作者：
Hasan, Muhammad Waleed [1 ]
Deeb, Laura [1 ]
Kumaniaev, Sergei [1 ]
Wei, Chenglu [1 ]
Wang, Kaiying [1 ]
机构：
[1] Department of Microsystems, University of South–Eastern Norway, Horten,3184, Norway
来源：
Micromachines | 2024年 / 15卷 / 09期
关键词：
Compendex;
D O I：
10.3390/mi15091122
中图分类号：
学科分类号：
摘要：
Extreme ultraviolet lithography - Hydrolysis - Ionization of gases - Ionization of liquids - Oxide semiconductors - Photoresists - Three dimensional integrated circuits
引用
下载
收藏
相关论文
共 50 条
  • [41] Robotic synthesis of peptides containing metal-oxide-based amino acids
    She, Shan
    Bell, Nicola L.
    Zheng, Dazhong
    Mathieson, Jennifer S.
    Castro, Maria D.
    Long, De-Liang
    Koehnke, Jesko
    Cronin, Leroy
    CHEM, 2022, 8 (10): : 2734 - 2748
  • [42] Towards development of chemosensors and biosensors with metal-oxide-based nanowires or nanotubes
    Liu, Aihua
    BIOSENSORS & BIOELECTRONICS, 2008, 24 (02): : 167 - 177
  • [43] Recent advances in hybrid solar cells based on metal oxide nanostructures
    Qi, Juanjuan
    Chen, Junwei
    Meng, Weili
    Wu, Xiaoyan
    Liu, Changwen
    Yue, Wenjin
    Wang, Mingtai
    SYNTHETIC METALS, 2016, 222 : 42 - 65
  • [44] Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography
    Peng, Xiaoman
    Wang, Yafei
    Xu, Jian
    Yuan, Hua
    Wang, Liangqian
    Zhang, Tao
    Guo, Xudong
    Wang, Shuangqing
    Li, Yi
    Yang, Guoqiang
    MACROMOLECULAR MATERIALS AND ENGINEERING, 2018, 303 (06)
  • [45] Advances in computer simulations of LPP sources for EUV Lithography
    Hassanein, A.
    Sizyuk, T.
    EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY IV, 2013, 8679
  • [46] New Concepts in All Metal-Oxide-Based Ultraviolet Transparent Photovoltaics
    Sadanand
    Patel, Malkeshkumar
    Kumar, Naveen
    Lee, Woochan
    Kim, Joondong
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2022, 69 (09) : 5021 - 5027
  • [47] BEHAVIOR OF METAL-OXIDE-BASED VARISTORS SUBJECTED TO PARTIAL DISCHARGES IN AIR
    KOURDI, MB
    BUI, A
    LOUBIERE, A
    KHEDIM, A
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1992, 25 (03) : 548 - 551
  • [48] Recent advances in EUV solar astronomy
    Doschek, GA
    ASTROPHYSICS IN THE EXTREME ULTRAVIOLET, 1996, : 503 - 510
  • [49] Recent advances in molecular lithography
    Norton, Michael
    Rahman, Mashiur
    Day, B. Scott
    Huffman, Chad
    Cao, Huan
    Neff, David
    Butts, Heather
    Gin, Aaron
    NANOSENSING: MATERIALS, DEVICES, AND SYSTEMS III, 2007, 6769
  • [50] LIQUID-METAL ION SOURCES FOR LITHOGRAPHY - SOME RECENT ADVANCES
    PREWETT, PD
    MCMILLAN, DJ
    JEFFERIES, DK
    MAIR, GLR
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1983, 393 : 120 - 128
12345