Recent Advances in Metal-Oxide-Based Photoresists for EUV Lithography

被引：0
|
作者：
Hasan, Muhammad Waleed [1 ]
Deeb, Laura [1 ]
Kumaniaev, Sergei [1 ]
Wei, Chenglu [1 ]
Wang, Kaiying [1 ]
机构：
[1] Department of Microsystems, University of South–Eastern Norway, Horten,3184, Norway
来源：
Micromachines | 2024年 / 15卷 / 09期
关键词：
Compendex;
D O I：
10.3390/mi15091122
中图分类号：
学科分类号：
摘要：
Extreme ultraviolet lithography - Hydrolysis - Ionization of gases - Ionization of liquids - Oxide semiconductors - Photoresists - Three dimensional integrated circuits
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