Formulation of a viscoelastic stress problem using analytical integration and its application to viscoelastic oxidation simulation

被引：0
|
作者：
Uchida, Tetsuya [1 ]
Nishi, Kenji [1 ]
机构：
[1] Advanced Technology Research Dept., Semicon. Leading Edge Technol. Inc., 292 Yoshida, Totsuka, Yokohama 244-0817, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2001年 / 40卷 / 12期
关键词：
D O I：
10.1143/jjap.40.6711
中图分类号：
学科分类号：
摘要：
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页码：6711 / 6719
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