Chemical vapor deposition of cobalt using novel cobalt(I) precursors

被引:0
|
作者
Choi, Hyungsoo [1 ]
Park, Sungho [1 ]
Jang, Ho G. [1 ]
机构
[1] Beckman Inst. for Adv. Sci./Technol., University of Illinois at UC, 405 North Mathews Avenue, Urbana, IL 61801, United States
关键词
This work was supported by the National Science Foundation under Grant No. CHE-9973575. S. Park was supported by the Office of Naval Research and CRM-KOSEF (2001). We thank the Center for Microanalysis of Materials of Frederick Seitz Materials Research Laboratory at University of Illinois at Urbana-Champaign for the use of SEM and XPS;
D O I
暂无
中图分类号
学科分类号
摘要
13
引用
收藏
相关论文
共 50 条
  • [21] Growth of carbon nanotubes on cobalt disilicide precipitates by chemical vapor deposition
    Mao, JM
    Sun, LF
    Qian, LX
    Pan, ZW
    Chang, BH
    Zhou, WY
    Wang, G
    Xie, SS
    APPLIED PHYSICS LETTERS, 1998, 72 (25) : 3297 - 3299
  • [22] Chemical vapor deposition of low reflective cobalt (II) oxide films
    Amin-Chalhoub, Eliane
    Duguet, Thomas
    Samelor, Diane
    Debieu, Olivier
    Ungureanu, Elisabeta
    Vahlas, Constantin
    APPLIED SURFACE SCIENCE, 2016, 360 : 540 - 546
  • [23] LASER CHEMICAL VAPOR-DEPOSITION OF COBALT THIN-FILMS
    SCHULMEISTER, K
    LUNNEY, JG
    BUCKLEY, B
    JOURNAL OF APPLIED PHYSICS, 1992, 72 (08) : 3480 - 3484
  • [24] Ion beam induced chemical vapor deposition (IBICVD) of cobalt particles
    Lapicki, A
    Ahmad, E
    Suzuki, T
    JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 2002, 240 (1-3) : 47 - 49
  • [25] Chemical vapor deposition of novel precursors for advanced capacitor electrodes
    Peck, J
    Hoover, CA
    Atwood, JD
    Hoth, DC
    Consiglio, S
    Papadatos, F
    Eisenbraun, E
    RAPID THERMAL AND OTHER SHORT-TIME PROCESSING TECHNOLOGIES III, PROCEEDINGS, 2002, 2002 (11): : 235 - 242
  • [26] SOLUTION FOR CHEMICAL COBALT DEPOSITION
    LUNYATSKAS, AM
    ROZOVSKII, GI
    SAVITSKAS, AI
    RADZHYUNENE, VM
    JOURNAL OF APPLIED CHEMISTRY OF THE USSR, 1975, 48 (08): : 1771 - 1773
  • [27] COBALT OXIDE THIN-FILMS PREPARED BY CHEMICAL VAPOR-DEPOSITION FROM COBALT(II) ACETATE
    MARUYAMA, T
    NAKAI, T
    SOLAR ENERGY MATERIALS, 1991, 23 (01): : 25 - 29
  • [28] New Heteroleptic Cobalt Precursors for Deposition of Cobalt-Based Thin Films
    Han, Seong Ho
    George, Sheby Mary
    Lee, Ga Yeon
    Han, Jeong Hwan
    Park, Bo Keun
    Kim, Chang Gyoun
    Son, Seung Uk
    Lah, Myoung Soo
    Chung, Taek-Mo
    ACS OMEGA, 2017, 2 (09): : 5486 - 5493
  • [29] COPPER(I) PRECURSORS FOR CHEMICAL VAPOR-DEPOSITION OF COPPER METAL
    KUMAR, R
    FRONCZEK, FR
    MAVERICK, AW
    LAI, WG
    GRIFFIN, GL
    CHEMISTRY OF MATERIALS, 1992, 4 (03) : 577 - 582
  • [30] Cyclodextrin inclusion complexes as novel MOCVD precursors for potential cobalt oxide deposition
    Papadopoulos, N. D.
    Karayianni, H. S.
    Tsakiridis, P. E.
    Perraki, M.
    Hristoforou, E.
    APPLIED ORGANOMETALLIC CHEMISTRY, 2010, 24 (02) : 112 - 121