Microstructure and dielectric properties of sputtered (Ba 0.3Sr0.7)TiO3 thin films with amorphous interfacial layers

被引:0
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作者
Lin, Tai-Nan [1 ]
Chu, Jinn P. [1 ]
Wang, Sea-Fue [2 ]
Wu, Cheng-Hui [1 ]
机构
[1] Institute of Materials Engineering, National Taiwan Ocean University, Keelung 202, Taiwan
[2] Department of Materials and Mineral Engineering, National Taipei University of Technology, Taipei, Taiwan
来源
| 1600年 / Japan Society of Applied Physics卷 / 44期
关键词
Activation energy - Amorphous materials - Crystallization - Dielectric materials - Microstructure - Permittivity - Sputtering;
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摘要
Crystallization behavior, microstructure and dielectric properties of sputtered (Ba0.3Sr0.7)TiO3thin films have been studied. The crystallization from as-deposited amorphous structure to equilibrium crystalline structure is confirmed as an irreversible, exothermic and first-order transition by differential scanning calorimetry. At a heating rate of 20°C/min, the exothermic peak temperature for crystallization is measured to be 697.3°C. Transmission electron microscopy results reveal layered structures of amorphous and perovskite crystalline phases in the films deposited at temperatures between 450 and 650°C. The amorphous interfacial layer diminishes with increasing substrate temperature and a well-crystallized film is found at 750°C with a dielectric loss of 0.021. Dielectric constant shows an abrupt increase to 187 for the film deposited at 750°C as a result of the fully crystallized structure. The measured dielectric constants at different temperatures are well consistent with those calculated based on the presence of amorphous interfacial layers in the films. © 2005 The Japan Society of Applied Physics.
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