Influence of buffer layer on adhesion of 1064 nm, 532 nm frequency-doubled antireflection coating to LBO crystal

被引：0
|
作者：
Tan, Tianya [1 ,2 ]
Wu, Wei [1 ,2 ]
Guo, Yongxin [1 ,2 ]
Shao, Jianda [3 ]
Fan, Zhengxiu [3 ]
机构：
[1] Department of Physics, Liaoning University, Shenyang 110036, China
[2] Shenyang Key Laboratory of Photoelectronic Devices and Detection Technology, Shenyang 110036, China
[3] Research and Development Center for Optical Thin Film Coatings, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, P.O. Box 800-211, Shanghai 201800, China
来源：
Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams | 2009年 / 21卷 / 09期
关键词：
Compendex;
D O I：
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中图分类号：
学科分类号：
摘要：
Adhesion
引用
收藏
页码：1343 / 1346
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