Characteristics of copper diffusion into low dielectric constant plasma polymerized cyclohexane thin films

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作者：
机构：
[1] Shim, Cheonman
[2] Choi, Jayoung
[3] Jung, Donggeun
[4] Lee, Nae-Eung
[5] Yang, Cheol-Woong
来源：
Shim, Cheonman | 2000年 / JJAP, Tokyo卷 / 39期
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D O I：
10.1143/jjap.39.l1327
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