Optical model for spectroscopic ellipsometry analysis of plasma-induced damage to SiOC films

被引：0
|
作者：
Nishida, Kentaro [1 ]
Ono, Kouichi [1 ]
Eriguchi, Koji [1 ]
机构：
[1] Graduate School of Engineering, Kyoto University, Kyoto,615-8540, Japan
来源：
Japanese Journal of Applied Physics | 2017年 / 56卷 / 06期
关键词：
Number: 15H03582,16K14405, Acronym: -, Sponsor: -; Number:; 15H04159; Acronym:; KAKEN; Sponsor: Japan Society for the Promotion of Science; -; MEXT; Sponsor: Ministry of Education; Culture; Sports; Science and Technology;
D O I：
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学科分类号：
摘要：
Spectroscopic ellipsometry
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