Effects of additives and annealing atmospheres on the microstructure of MnZn ferrite thin films
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作者:
Oka, Hiroko
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Graduate School of Science and Eng., Saitama Univ., 255 Shimo-ohkubo, Saltama 338-8570, JapanGraduate School of Science and Eng., Saitama Univ., 255 Shimo-ohkubo, Saltama 338-8570, Japan
Oka, Hiroko
[1
]
Kakizaki, Koichi
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Graduate School of Science and Eng., Saitama Univ., 255 Shimo-ohkubo, Saltama 338-8570, JapanGraduate School of Science and Eng., Saitama Univ., 255 Shimo-ohkubo, Saltama 338-8570, Japan
Kakizaki, Koichi
[1
]
Hiratsuka, Nobuyuki
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Graduate School of Science and Eng., Saitama Univ., 255 Shimo-ohkubo, Saltama 338-8570, JapanGraduate School of Science and Eng., Saitama Univ., 255 Shimo-ohkubo, Saltama 338-8570, Japan
Hiratsuka, Nobuyuki
[1
]
机构:
[1] Graduate School of Science and Eng., Saitama Univ., 255 Shimo-ohkubo, Saltama 338-8570, Japan
Manganese zinc ferrite thin films were prepared on quartz substrates buffered by a (00l) oriented ZnO underlayer by conventional rf magnetron sputtering method Mn-Zn-Fe oxide layers deposited on the ZoO underlayers were annealed in various atmospheres at 800°C for 5 hours. When the films were annealed either at reduced pressure in air or in N2 gas flow, single phase spinel-type ferrite was formed. Manganese zinc ferrite films annealed in N2 gas flow had excellent soft magnetic characteristics compared with the films annealed at reduced pressure in air because of their remarkable grain growth. Furthermore, Bi2O3 and V2O5 were added for the purpose of inducing crystal grain growth. Manganese zinc ferrite films with Bi2O3 were improved in their saturation magnetization because of their grain growth and good crystallinity. On the other hand, manganese zinc ferrite films with V2O5 showed excellent soft magnetic characteristics, when vanadium of 0.51 at.% was added.
机构:
Indian Inst Technol Madras, Nano Funct Mat Technol Ctr, Dept Phys, Chennai 600036, Tamil Nadu, IndiaIndian Inst Technol Madras, Nano Funct Mat Technol Ctr, Dept Phys, Chennai 600036, Tamil Nadu, India
Das, Dhruba
Rao, M. S. Ramachandra
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Indian Inst Technol Madras, Nano Funct Mat Technol Ctr, Dept Phys, Chennai 600036, Tamil Nadu, IndiaIndian Inst Technol Madras, Nano Funct Mat Technol Ctr, Dept Phys, Chennai 600036, Tamil Nadu, India
机构:
Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, JapanDepartment of Physical Electronics, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, Japan
Kitamoto, Yoshitaka
Nakagawa, Shigeki
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Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, JapanDepartment of Physical Electronics, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, Japan
Nakagawa, Shigeki
Abe, Masanori
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Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, JapanDepartment of Physical Electronics, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, Japan
Abe, Masanori
Naoe, Masahiko
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Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, JapanDepartment of Physical Electronics, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, Japan
Naoe, Masahiko
Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy,
2000,
47
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170
机构:
Technion Israel Inst Technol, Dept Mat Sci & Engn, IL-32000 Haifa, Israel
Inst Single Crystals NASU, UA-61001 Kharkov, UkraineTechnion Israel Inst Technol, Dept Mat Sci & Engn, IL-32000 Haifa, Israel
Kosinova, Anna
Kovalenko, Oleg
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Technion Israel Inst Technol, Dept Mat Sci & Engn, IL-32000 Haifa, IsraelTechnion Israel Inst Technol, Dept Mat Sci & Engn, IL-32000 Haifa, Israel
Kovalenko, Oleg
Klinger, Leonid
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Technion Israel Inst Technol, Dept Mat Sci & Engn, IL-32000 Haifa, IsraelTechnion Israel Inst Technol, Dept Mat Sci & Engn, IL-32000 Haifa, Israel
Klinger, Leonid
Rabkin, Eugen
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Technion Israel Inst Technol, Dept Mat Sci & Engn, IL-32000 Haifa, IsraelTechnion Israel Inst Technol, Dept Mat Sci & Engn, IL-32000 Haifa, Israel