Effect of N2 flow rate on the properties of N doped TiO2 films deposited by DC coupled RF magnetron sputtering

被引：0

作者：

Peng, Shou ^{[1
,2
]}

Yang, Yong ^{[2
]}

Li, Gang ^{[2
]}

Jiang, Jiwen ^{[2
]}

Jin, Kewu ^{[2
]}

Yao, TingTing ^{[2
]}

Zhang, Kuanxiang ^{[2
]}

Cao, Xin ^{[2
,3
]}

Wang, Yun ^{[2
]}

Xu, Genbao ^{[2
]}

机构：

[1] State Key Laboratory of Silicate Materials for Architectures, Wuhan University of Technology, Wuhan,430000, China

[2] State Key Laboratory of Advanced Technology for Float Glass, Bengbu Design and Research Institute for Glass Industry, Bengbu,233000, China

[3] School of Materials Science and Engineering, Dalian Jiaotong University, Dalian,116000, China

来源：

Journal of Alloys and Compounds | 2016年 / 678卷

关键词：

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：355 / 359

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