Thin-film transistors with polycrystalline silicon films prepared by two-step rapid thermal annealing

被引：0
|
作者：
Cheng, Huang-Chung [1 ]
Huang, Chun-Yao [1 ]
Wang, Fang-Shing [1 ]
Lin, Kuen-Hsien [1 ]
Tarntair, Fu-Gow [1 ]
机构：
[1] Dept. Electronics Eng. Inst. E., Semiconductor Research Center, National Chiao-Tung University, 1001 Ta Hsueh Road, HsinChu 300, Taiwan
来源：
| 2000年 / JJAP, Tokyo卷 / 39期
关键词：
D O I：
10.1143/jjap.39.l19
中图分类号：
学科分类号：
摘要：
16
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